Meshulach, Doron: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Characterization of EUV resists for defectivity at 32nm

Raymond, Christopher J., Montal, Ofir, Dolev, Ido, Rosenzweig, Moshe, Dotan, Kfir, Meshulach, Doron, Adan, Ofer, Levi, Shimon, Cai, Man-Ping, Bencher, Chris, Ngai, Chris S., Jehoul, Christiane, Van De

Year:

2011

Language:

english

File:

PDF, 2.12 MB

english, 2011

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Advanced lithography: wafer defect scattering analysis at DUV

Meshulach, Doron, Raymond, Christopher J., Dolev, Ido, Yamazaki, Yuuichiro, Tsuchiya, Kenji, Kaneko, Makoto, Yoshino, Kiminori, Fujii, Takayoshi

Year:

2010

Language:

english

File:

PDF, 570 KB

english, 2010

3

Coherent quantum control of multiphoton transitions by shaped ultrashort optical pulses

Meshulach, Doron, Silberberg, Yaron

Journal:

Physical Review A

Year:

1999

Language:

english

File:

PDF, 158 KB

english, 1999

4

SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Evidence of printing blank-related defects on EUV masks missed by blank inspection

Jonckheere, Rik, Behringer, Uwe F.W., Van den Heuvel, Dieter, Bret, Tristan, Hofmann, Thorsten, Magana, John, Aharonson, Israel, Meshulach, Doron, Hendrickx, Eric, Ronse, Kurt

Year:

2011

Language:

english

File:

PDF, 4.89 MB

english, 2011

5

10.1038/24329

Silberberg, Yaron, Meshulach, Doron

Journal:

Year:

1998

Language:

english

File:

PDF, 314 KB

english, 1998

6

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Polarization control for enhanced defect detection on advanced memory devices

Lee, Byoung-Ho, Ihm, Dong-Chul, Yeo, Jeong-Ho, Gluk, Yael, Meshulach, Doron, Archie, Chas N.

Year:

2006

Language:

english

File:

PDF, 151 KB

english, 2006

7

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Additional evidence of EUV blank defects first seen by wafer printing

Jonckheere, Rik, Maurer, Wilhelm, Abboud, Frank E., Van den Heuvel, Dieter, Bret, Tristan, Hofmann, Thorsten, Magana, John, Aharonson, Israel, Meshulach, Doron, Hendrickx, Eric, Ronse, Kurt

Year:

2011

Language:

english

File:

PDF, 3.44 MB

english, 2011

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping LER and defect density on production wafers

Shabtay, Saar, Allgair, John A., Raymond, Christopher J., Blumberg, Yuval, Levi, Shimon, Greenberg, Gadi, Harel, Daniel, Conley, Amiad, Meshulach, Doron, Kan, Kobi, Dolev, Ido, Kumar, Surender, Mendel

Year:

2009

Language:

english

File:

PDF, 797 KB

english, 2009

9

SPIE Proceedings [SPIE 10th Meeting on Optical Engineering in Israel - Jerusalem, Israel (Sunday 2 March 1997)] 10th Meeting on Optical Engineering in Israel - One- and two-dimensional spectral interference measurements of ultrashort optical pulses

Meshulach, Doron, Yelin, Dvir, Silberberg, Yaron, Shladov, Itzhak, Rotman, Stanley R.

Year:

1997

Language:

english

File:

PDF, 813 KB

english, 1997

10

SPIE Proceedings [SPIE 10th Meeting on Optical Engineering in Israel - Jerusalem, Israel (Sunday 2 March 1997)] 10th Meeting on Optical Engineering in Israel - Intensity and interferometric autocorrelation measurements of ultrashort pulses by third harmonic generation

Meshulach, Doron, Barad, Y., Silberberg, Yaron, Shladov, Itzhak, Rotman, Stanley R.

Year:

1997

Language:

english

File:

PDF, 405 KB

english, 1997

11

Adaptive Compression and Shaping of Femtosecond Pulses

Meshulach, Doron, Yelin, Dvir, Silberberg, Yaron

Journal:

Optics and Photonics News

Year:

1998

Language:

english

File:

PDF, 349 KB

english, 1998

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - AWV: high-throughput cross-array cross-wafer variation mapping

Yeo, Jeong-Ho, Allgair, John A., Raymond, Christopher J., Lee, Byoung-Ho, Lee, Tae-Yong, Greenberg, Gadi, Meshulach, Doron, Ravid, Erez, Levi, Shimon, Kan, Kobi, Shabtay, Saar, Cohen, Yehuda, Rotlevi,

Year:

2008

Language:

english

File:

PDF, 948 KB

english, 2008

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